Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors

The extreme ultraviolet (EUV) phase retarder is an important optical element for polarization analysis and conversion of EUV synchrotron radiation. In this paper, a linearly chirped Mo/Si multilayer mirror used to design retarder. With increasing thickness variation the multilayer, reflective retardation between s- p-polarized light increases at first then reaches its maximum value. When bilayer number from 2 20, source with photon energy 90 eV 5.97° 245.10° 14.7 nm central thickness. addition, retardations mirrors different energies (80 eV, 85 eV) are also investigated compared. Furthermore, physical mechanism improvement studied by investigating field intensity distributions inside mirrors.